The General Information about the Blog

    This blog is used for Y2 Mini-Project 26, EEE department, University of Liverpool.

    The title of the project is Modelling Electrical Properties of the Thin High-k Gate Stacks (HfSiO, 70%Hf). 

    The research group consists of three students, which are, Kaibin Ji, Fan Hu and Yizhou Jiang.  Dr. Ivona Mitrovic is the supervisor of the project. This project will last for about 6 weeks, including a final report and a bench inspiration for assessment.

    The main object of the project is to find out the electrical properties of the thin high-k gate stacks (HfSiO 70% Hf), a new material may replace SiO2 in the future for gate stack of MOSFET. There are 10 tasks need to be completed in the future, the results will be posted in this blog later.

    If you have any questions or suggestions for the blog, please feel free to contact us.